Micro-etching on films having nano thickness, micro-etching on functional materials / Laser Engraving & Micro Cutting Machines Manufacturer | Hortech Co.

High-precision micro-etching system for pattern production with high yield rates / Self-developed, patented precision laser systems and machines, optimal processes, integrated laser and optic-mechatronic technologies.

Laser Micro-etching System for Thin Films - High-precision micro-etching system for pattern production with high yield rates
  • Laser Micro-etching System for Thin Films - High-precision micro-etching system for pattern production with high yield rates

Laser Micro-etching System for Thin Films

Micro-etching on films having nano thickness, micro-etching on functional materials

This micro-etching system employs the cold laser to perform micro-etching on conductive thin films. Shaking or inaccurate wiring would fail both the process and outcome of precision laser finishing. This system attaches the surface of a material on a highly flat area for accurate focusing. In this way, thin films can be stably micro-etched by consistent laser energy. It does not need subsequent repairs. Furthermore, it helps achieve high yield rates. This system is designed for pattern production on thin films. Laser micro-etching is implemented to produce sensor substrates.

Precision Laser Micro-Etching System for Mass Finishing Thin Films

Hortech combines a custom made high precision motion control platform with the optical focus laser system to build this system. The energy density of the laser is highly stable, which is employed in accordance with 2D precision motion. This enables steady mass micro-etching and further achieves high yield rates.

Laser Micro-Etching System with High Flatness and Steady Energy
  • Large area with high flatness < +/- 20um.
  • Vacuum cleaning for dust removal.
  • The optical focusing of the laser is aligned with the finishing surface.
Laser System for Circuit Pattern Production on Nano Thin Films
  • The linewidth of the laser micro-etching is smaller than 20um on films at 4 - 12um.
  • The collimation degree of the laser line < +/- 2um.
  • The turning R angle of the laser is <20um according to the client's request.
  • The positioning accuracy of the laser is < +/- 5um at 500 x 500mm.
  • The required laser sources include: 1030-1070, 515-532, 343-355, 257-258nm.
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Laser Micro-etching System for Thin Films | Laser Engraving & Micro Cutting Machines Manufacturer | Hortech Co.

Located in Taiwan since 2006, Hortech Company has been a manufacturer providing precision laser processing services and custom designed machines. Its core techniques include: Laser Micro-etching System for Thin Films, laser micro-etching, micro-drilling, micro-cutting, and laser engraving. It has successfully developed products for diverse industries, including optical scales for factory automation and robotics, superfine reticles for the defense industry, and wafer dicing and drilling for the semiconductor industry. Hortech's laser OEM/ODM services have served industrial partners from around the world.

Hortech Company was established by Dr. Owen Chun Hao Li in 2016. It has developed a laser marking system used for the traceability of medical circuit boards for a Taiwanese circuit manufacturer in 2018. It has developed the triple wavelength laser combined machining system for a Singapore manufacturer in 2017. It produced different types of magnetic and optical scales with high accuracy for encoders and actuators since 2019. Hortech kept upgrading its laser machines and expanding its services to different regions. Its rigorous quality control processes ensures its clients' needs are satisfied.

Hortech Co. has been offering customers ultra-precision laser machining services and laser CNC machines since 2006, both with advanced technology and 27 years of experiences, Hortech Co. ensures each customer's demands are met.